The Laboratory is undertaking four priority research programs covering multistage purification technologies for ultra-high-purity electronic chemicals, functional formulated chemicals, compound semiconductor materials, and photoresists and ancillary materials. These programs aim to overcome critical technological bottlenecks in chemicals for microelectronics and support the development of a world-class electronic chemicals industrial cluster.
1.Development of analytical methods for trace impurities in ultra-high-purity electronic chemicals.
2.New multistage purification technologies for electronic specialty gases.
3.Mechanistic studies of organic-contaminant removal and metal-corrosion inhibition by active ingredients in cleaning solutions.
4.Nucleation and growth mechanisms of nanoscale abrasives in polishing slurries.
5.Preparation technologies for high-purity gallium phosphide single crystals.
6.Efficient purification processes for removing metal ions and particulates from diazonaphthoquinone-based photoactive compounds.
7.Analytical techniques for ultratrace metal ions and particulates in photoactive compounds.
8.Formulation technologies for novel g-line and i-line photoresists.
